conventions
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conventions [2018/03/14 01:54] – [Image] mcmaster | conventions [2025/01/22 05:35] (current) – [Objective] bunnie | ||
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* For others, see below | * For others, see below | ||
- | mcmaster: I've been calling intermediate etchings in more complex processes like s3-7 meaning sample 3, processing step 7. This avoids spending too much time trying to classify something that isn't really a purely poly or active | + | mcmaster: |
+ | * I've been calling intermediate etchings in more complex processes like s3-7 meaning sample 3, processing step 7 | ||
+ | * This avoids spending too much time trying to classify something that isn't really a purely poly or active | ||
Conventions: | Conventions: | ||
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* Metal layer | * Metal layer | ||
* If the number of layers in the chip is known (from a cross section, etc): //mN//, where N starts from 1 at the lowest layer and counts up | * If the number of layers in the chip is known (from a cross section, etc): //mN//, where N starts from 1 at the lowest layer and counts up | ||
- | * If the number of layers is not known: //mN//, where N starts from the letter | + | * If the number of layers is not known: //mN//, where N starts from the letter |
====== Image ====== | ====== Image ====== | ||
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Some sample image names: | Some sample image names: | ||
* st_24c02_mz_ns50xu.jpg: | * st_24c02_mz_ns50xu.jpg: | ||
- | * st_24c02_mz.jpg: | + | * st_24c02_mz.jpg: |
+ | * Complex example | ||
+ | * ti_tms32010c-70015_s1-2_mit20x_rom.jpg | ||
+ | * Vendor: Texas Instruments (ti) | ||
+ | * Chip: TMS32010C | ||
+ | * Chip variant: 70015 (in this case the ROM programming) | ||
+ | * s1-2: sample 1, processing step 2. Please list processing steps on wiki page if available | ||
+ | * mit20x: objective used | ||
+ | * rom: a region of interest within the 20x scan | ||
+ | * wafer example | ||
+ | * mos_8564r6-wafer_mz_die.jpg: | ||
+ | * mos_8564r6-wafer_mz_9079r2.jpg: | ||
===== Technique ===== | ===== Technique ===== | ||
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* am100x: AmScope 100x (oil immersion) | * am100x: AmScope 100x (oil immersion) | ||
* bli20x: Bausch & Lomb industrial 20x (designed for stereozoom series) | * bli20x: Bausch & Lomb industrial 20x (designed for stereozoom series) | ||
+ | * boli10xir: Boli Optics M Plan Apo 10x NIR (comparable to Mitsutoyo) | ||
* ch2x: cheap supposedly Apo 2x objective that may be made of soda glass (green tinge…). | * ch2x: cheap supposedly Apo 2x objective that may be made of soda glass (green tinge…). | ||
* mit5x: Mitutoyo M Plan Apo 5x | * mit5x: Mitutoyo M Plan Apo 5x | ||
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* mit50xn: Mitutoyo M Plan Apo 50x Near UV | * mit50xn: Mitutoyo M Plan Apo 50x Near UV | ||
* mit100x: Mitutoyo M Plan Apo 100x | * mit100x: Mitutoyo M Plan Apo 100x | ||
+ | * nikon20x: Nikon M Plan 20x ELWD | ||
* neo5x: Olympus Neo 5x | * neo5x: Olympus Neo 5x | ||
* nd5x: Olympus Neo DPlan 5x | * nd5x: Olympus Neo DPlan 5x | ||
* ns50x: Olympus Neo SPlan 50x | * ns50x: Olympus Neo SPlan 50x | ||
* ns50xu: Olympus Neo SPlan 50x ultra-long working distance (ULWD) | * ns50xu: Olympus Neo SPlan 50x ultra-long working distance (ULWD) | ||
+ | * md5x: Olympus MDPlan 5x | ||
+ | * ms10x: Olympus MSPlan 10x | ||
+ | * ms20x: Olympus MSPlan 20x | ||
+ | * ms50x: Olympus MSPlan 50x | ||
+ | * ms100x: Olympus MSPlan 100x | ||
+ | * opl100x: Olympus Plan 100x Oil 1.25NA | ||
+ | * oplcn100x: Olympus Plan CN 100x Oil 1.25NA | ||
* sz or zoom: Zoom microscope, generally no scale bar provided because magnification varies (unless that particular zoom setting was calibrated during the same imaging session) | * sz or zoom: Zoom microscope, generally no scale bar provided because magnification varies (unless that particular zoom setting was calibrated during the same imaging session) | ||
- | |||
- | Scales | ||
- | |||
- | ^ Scope ^ Objective | ||
- | | pr0nscope | ||
- | | pr0nscope | ||
- | | pr0nscope | ||
- | | pr0nscope | ||
- | | pr0nscope | ||
- | | pr0nscope | ||
- | | pr0nscope | ||
- | | pr0nscope | ||
See also | See also |
conventions.1520992461.txt.gz · Last modified: 2018/03/14 01:54 by mcmaster