Differences

This shows you the differences between two versions of the page.

--- mcmaster:raspberry-pi:rp2-b0 [2021/01/29 08:29] – created mcmaster
+++ mcmaster:raspberry-pi:rp2-b0 [2023/02/16 10:17] (current) – external edit 127.0.0.1
@@ Line 1: / Line 1: @@
-{{tag>collection_mcmaster vendor_raspberry-pi type_unknown year_unknown foundry_unknown}}
+{{tag>collection_mcmaster vendor_raspberry-pi type_unknown year_2020 foundry_tsmc}}
+Chip is from RP2040 (Raspberry Pi Pico). [[https://twitter.com/johndmcmaster/status/1355092011829719046|More images here]]
 ====== Package ======
@@ Line 6: / Line 8: @@
 <code>
+RP2-B0 20/34
+P64M15.OQ TTT
 </code>
@@ Line 16: / Line 20: @@
 <code>
+RP2 B0 2020(C)
+M8 R0
+M7 R0
+V6 B0
 </code>
-[[https://siliconpr0n.org/map/raspberry-pi/rp2-b0/mz_mit20x/|mz_mit20x]]
+[[https://siliconpr0n.org/map/raspberry-pi/rp2-b0/mcmaster_mz_mit20x/|mz_mit20x]]
+    * [[https://siliconpr0n.org/map/raspberry-pi/rp2-b0/single/raspberry-pi_rp2-b0_mcmaster_mz_mit20x.jpg|Single]] (4861x4721, 8171000B)
+[[https://siliconpr0n.org/map/raspberry-pi/rp2-b0/mcmaster_s1-9_mit20x/|s1-9_mit20x]]
+    * [[https://siliconpr0n.org/map/raspberry-pi/rp2-b0/single/raspberry-pi_rp2-b0_mcmaster_s1-9_mit20x.jpg|Single]] (4932x4798, 7180040B)
+[[https://siliconpr0n.org/map/raspberry-pi/rp2-b0/mcmaster_s1-9_vc60x/|s1-9_vc60x]]
-    * [[https://siliconpr0n.org/map/raspberry-pi/rp2-b0/single/raspberry-pi_rp2-b0_mz_mit20x.jpg|Single]] (4861x4721, 8171000B)
+    * [[https://siliconpr0n.org/map/raspberry-pi/rp2-b0/single/raspberry-pi_rp2-b0_mcmaster_s1-9_vc60x.jpg|Single]] (14876x14436, 38.8783MiB)
-[[https://siliconpr0n.org/map/raspberry-pi/rp2-b0/s1-9_mit20x/|s1-9_mit20x]]
-    * [[https://siliconpr0n.org/map/raspberry-pi/rp2-b0/single/raspberry-pi_rp2-b0_s1-9_mit20x.jpg|Single]] (4932x4798, 7180040B)
+^ Process step  ^ Process                                        ^ Notes                                                                                                                      ^
+| s1-1          | 2 min 20% hf\\ 2 min hcl/h2o2                  | minor corrosion on top metal                                                                                               |
+| s1-2          | 2 min 20% hf\\ 1 min hcl/h2o2\\ 2 min barrier  |                                                                                                                            |
+| s1-3          | 3 min 20% hf\\ 2 min barrier\\ 4 min hcl/h2o2  | misc process issues causing unintended times\\ significant top metal erosion of some sort\\ see stringers floating around  |
+| s1-4          | 3 min 20% hf\\ 2 min hcl/h2o2\\ 4 min barrier  | significant erosion into oxide\\ looks like maybe some wax residue on die?\\ Gentle IPA scrub w/ foam tip removed it       |
+| s1-5          | 2 min 20% hf\\ 2 min hcl/h2o2\\ 4 min barrier  | much more etching\\ lots of transistors exposed\\ keep going at this cadence\\ scrubbed die again to remove residue        |
+| s1-6          | 2 min 20% hf\\ 2 min hcl/h2o2\\ 4 min barrier  |                                                                                                                            |
+| s1-7          | 2 min 20% hf\\ 2 min hcl/h2o2\\ no barrier     | Getting close to done\\ No barrier and no residue\\ Barrier etch must be eating wax                                        |
+| s1-8          | 2 min 20% hf\\ 2 min hcl/h2o2\\ no barrier     | getting close to done                                                                                                      |
+| s1-9          | 2 min 20% hf\\ 2 min hcl/h2o2\\ no barrier     | Very small oxide left\\ Call it good enough                                                                                |