tech:start
Differences
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- | This list includes ITRS standard nodes only, tag devices at the nearest appropriate | + | The intention of this table is to allow rough identification of a device' |
- | Please only tag devices whose process geometry is known for certain; this will allow us to more easily compare examples of devices at each node. | + | This list includes ITRS standard nodes only, tag devices at the nearest appropriate node. Please only tag devices whose process geometry is known for certain; this will allow us to more easily compare examples of devices at each node. |
- | FIXME: | + | Devices ≤ 90nm typically have thick top metal with a much larger design rule. There do not appear to be significant scaling trends in top metal pitch below 90nm, |
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+ | There are two Vcore columns. The typical numbers are the nominal operating voltages for standard process, the minimum numbers are the lowest voltages allowed for low-power versions of the process. | ||
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+ | Typically devices >180 nm are entirely Al metallization, | ||
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+ | ^Node ^Vcore (min) ^Vcore(typ) ^Layer count ^[[: | ||
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- | ^ Node ^ Vcore ^ Layer count ^ | ||
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tech/start.1421110049.txt.gz · Last modified: 2015/01/13 00:47 by azonenberg