This shows you the differences between two versions of the page.
| Both sides previous revision Previous revision Next revision | Previous revision Last revision Both sides next revision | ||
|
conventions [2020/05/10 06:09] mcmaster [Table] |
conventions [2022/07/07 22:19] marmontel [Objective] |
||
|---|---|---|---|
| Line 7: | Line 7: | ||
| * For others, see below | * For others, see below | ||
| - | mcmaster: I've been calling intermediate etchings in more complex processes like s3-7 meaning sample 3, processing step 7. This avoids spending too much time trying to classify something that isn't really a purely poly or active | + | mcmaster: |
| + | * I've been calling intermediate etchings in more complex processes like s3-7 meaning sample 3, processing step 7 | ||
| + | * This avoids spending too much time trying to classify something that isn't really a purely poly or active | ||
| Conventions: | Conventions: | ||
| Line 31: | Line 33: | ||
| * st_24c02_mz_ns50xu.jpg: | * st_24c02_mz_ns50xu.jpg: | ||
| * st_24c02_mz.jpg: | * st_24c02_mz.jpg: | ||
| + | * Complex example | ||
| + | * ti_tms32010c-70015_s1-2_mit20x_rom.jpg | ||
| + | * Vendor: Texas Instruments (ti) | ||
| + | * Chip: TMS32010C | ||
| + | * Chip variant: 70015 (in this case the ROM programming) | ||
| + | * s1-2: sample 1, processing step 2. Please list processing steps on wiki page if available | ||
| + | * mit20x: objective used | ||
| + | * rom: a region of interest within the 20x scan | ||
| * wafer example | * wafer example | ||
| - | * mos_8564r6-wafer_mz.jpg: a MOS 8564R6 wafer top metal. Main chip | + | * mos_8564r6-wafer_mz_die.jpg: a MOS 8564R6 wafer top metal. Main chip |
| - | * mos_8564r6-wafer_mz-9079r2_mz.jpg: a MOS 8564R6 wafer top metal, but the test pattern 9079R2 | + | * mos_8564r6-wafer_mz_9079r2.jpg: a MOS 8564R6 wafer top metal, but the test pattern 9079R2 |
| ===== Technique ===== | ===== Technique ===== | ||
| Line 77: | Line 87: | ||
| * ns50x: Olympus Neo SPlan 50x | * ns50x: Olympus Neo SPlan 50x | ||
| * ns50xu: Olympus Neo SPlan 50x ultra-long working distance (ULWD) | * ns50xu: Olympus Neo SPlan 50x ultra-long working distance (ULWD) | ||
| + | * ms20x: Olympus MSPlan 20x | ||
| * sz or zoom: Zoom microscope, generally no scale bar provided because magnification varies (unless that particular zoom setting was calibrated during the same imaging session) | * sz or zoom: Zoom microscope, generally no scale bar provided because magnification varies (unless that particular zoom setting was calibrated during the same imaging session) | ||
| - | |||
| - | Scales | ||
| - | |||
| - | ^ Scope ^ Objective | ||
| - | | pr0nscope | ||
| - | | pr0nscope | ||
| - | | pr0nscope | ||
| - | | pr0nscope | ||
| - | | pr0nscope | ||
| - | | pr0nscope | ||
| - | | pr0nscope | ||
| - | | pr0nscope | ||
| See also | See also | ||