chemical:start
Differences
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chemical:start [2012/08/23 04:28] – mcmaster | chemical:start [2013/10/20 14:59] (current) – external edit 127.0.0.1 | ||
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Delayering: component of all wet etches | Delayering: component of all wet etches | ||
Can be stored in polymethylpentene (PMP), polyethylene (PE), and Teflon (PTFE). [Isotropic Silicon Etching using HF/ | Can be stored in polymethylpentene (PMP), polyethylene (PE), and Teflon (PTFE). [Isotropic Silicon Etching using HF/ | ||
- | ~2.5% HF solution can be found in Whink brand rust remover. Unfortunately, | ||
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- | ===== Health ===== | ||
HF is notably toxic | HF is notably toxic | ||
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+ | See [[HF]] for more details | ||
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====== Isopropanol (Isopropyl alcohol (IPA)) ====== | ====== Isopropanol (Isopropyl alcohol (IPA)) ====== |
chemical/start.1345696106.txt.gz · Last modified: 2013/10/20 14:59 (external edit)