User Tools

Site Tools


chemical:start

Differences

This shows you the differences between two versions of the page.

Link to this comparison view

Both sides previous revisionPrevious revision
Next revision
Previous revision
chemical:start [2012/08/23 04:28] mcmasterchemical:start [2013/10/20 14:59] (current) – external edit 127.0.0.1
Line 32: Line 32:
 Delayering: component of all wet etches Delayering: component of all wet etches
 Can be stored in polymethylpentene (PMP), polyethylene (PE), and Teflon (PTFE). [Isotropic Silicon Etching using HF/Nitric/Acetic Acid (HNA)] Can be stored in polymethylpentene (PMP), polyethylene (PE), and Teflon (PTFE). [Isotropic Silicon Etching using HF/Nitric/Acetic Acid (HNA)]
-~2.5% HF solution can be found in Whink brand rust remover. Unfortunately, due to health concerns with HF, this product is not sold in the EU. You still might be able to order it from somewhere overseas (ie eBay) cheap enough.  
- 
-===== Health ===== 
  
 HF is notably toxic HF is notably toxic
 +
 +See [[HF]] for more details
 +
  
 ====== Isopropanol (Isopropyl alcohol (IPA)) ======  ====== Isopropanol (Isopropyl alcohol (IPA)) ====== 
chemical/start.1345696106.txt.gz · Last modified: 2013/10/20 14:59 (external edit)