fet
Differences
This shows you the differences between two versions of the page.
Next revision | Previous revision | ||
fet [2016/01/03 06:44] – created mcmaster | fet [2016/01/03 08:02] (current) – [Xilinx XC2018] mcmaster | ||
---|---|---|---|
Line 1: | Line 1: | ||
This page focuses on MOSFET technology. | This page focuses on MOSFET technology. | ||
- | |||
====== MOSFET theory 101 ====== | ====== MOSFET theory 101 ====== | ||
Line 8: | Line 7: | ||
MOSFETs build on diodes by adding a control terminal to adjust charge between two similarly doped areas. | MOSFETs build on diodes by adding a control terminal to adjust charge between two similarly doped areas. | ||
- | {{: | + | {{: |
This ([[http:// | This ([[http:// | ||
A note of caution: chip designers know this is how people think when they try to copy chips. | A note of caution: chip designers know this is how people think when they try to copy chips. | ||
- | |||
====== MOSFET layout 101 ====== | ====== MOSFET layout 101 ====== | ||
- | But what are those funny triangles next to some of them? Lets go a little deeper. | + | {{:wiki:mosfet_functioning_modified.png}} |
- | {{:wiki:mosfet_functioning_modified.png|}} | + | With some high level theory, lets now look at how real world MOSFETs are built. |
- | Specifically it represents this schematic symbol ([[http:// | + | {{:wiki:igfet_n-ch_enh_labelled.png}} |
- | {{:wiki:igfet_n-ch_enh_labelled.png|}} | + | That transistor is represented by this schematic symbol ([[http:// |
- | Now we can understand that that triangle is a diode notation. | + | There are many ways to make a real device. |
- | To make the final point, the "no bulk" version above is a discrete MOSFET. | + | ====== Gate ====== |
- | {{gallery> | + | In general, there are three types of FET technology (in chronological order): |
- | Typical poly gate transistor from a typical standard cell based IC. Some of the contact | + | * Early aluminum |
+ | * Polysilicon gate | ||
+ | * Metal gate w/ high-k dielectric | ||
+ | Within each of these, especially polysilicon gates, there are many variations. | ||
- | ====== | + | ====== |
- | In general, there are three types of FET technology (in chronological order): | + | ===== Gate: poly ===== |
- | * Early aluminum metal gate | + | |
- | * Polysilicon gate | + | |
- | * Metal gate w/ high-k dielectric | + | |
- | Within each of these, especially polysilicon gates, there are many variations. | + | ==== RSA SecurID 1C ==== |
+ | {{: | ||
- | ====== Metal Oxide Semiconductor Field Effect Transistor (MOSFET) ====== | + | Some of contact metal can be seen on the bottom but the gate itself is poly. The [[: |
- | Dominant type seen today. Original ones were true metal gate on an oxide as the name implies, but modern ones tend to use polysilicon instead. | ||
- | {{: | + | ==== Xilinx XC2018 ==== |
- | Above: classical metal gate type. From left to right: source, gate, drain. Note that gate and drain are more or less identical in CMOS. Colors are from thin film interference indicating different layer thicknesses. | + | |
- | {{:image:CMOS_metal_gate_transistor_no_metal.jpg?300}} | + | {{:mcmaster: |
- | Above: | + | |
+ | Similar process to the SecurID. | ||
+ | |||
+ | |||
+ | ==== MOS 6522 ==== | ||
+ | |||
+ | {{: | ||
+ | |||
+ | Above: | ||
+ | |||
+ | The top polysilicon connects is driven by a via at top left. | ||
+ | |||
+ | The bottom transistor side connects directly | ||
+ | |||
+ | |||
+ | ==== MOS 6526 ==== | ||
+ | |||
+ | {{: | ||
+ | |||
+ | Above: top metal image | ||
+ | |||
+ | Active area enters lower left and meets poly at a buried contact. | ||
+ | ==== CMOS quiz ==== | ||
+ | |||
+ | {{: | ||
+ | |||
+ | [[: | ||
Line 59: | Line 82: | ||
==== MOS MPS7083 ==== | ==== MOS MPS7083 ==== | ||
- | {{: | + | {{: |
- | {{: | + | {{: |
- | Above top: top metal. | + | Above top: top metal. |
- | Typical metal gate CMOS transistor as used in non-trivial chips (ie CPU). The control signal | + | Typical metal gate CMOS transistor as used in non-trivial chips (ie CPU). The gate driver comes in on the right through an active area. The SiO2 has a cutout to allow placing a (Al?) via up to M1. |
- | ==== Fairchild CD4011 ==== | + | M1 goes left where it meets an active area. The teal SiO2 M1 area has thick oxide that prevents it from coupling to the Si below. |
- | {{:image: | + | While the metal does spill over to some adjacent areas there are several things that prevent them from becoming an effective transistor: |
- | {{: | + | * They do not fully cut off active areas |
+ | * These areas are likely biased such that adding additional charge wouldn' | ||
- | Above textbook style metal gate transistors | + | ==== Fairchild CD4011 ==== |
+ | {{: | ||
- | ==== CMOS quiz ==== | + | {{: |
- | {{:quiz:metal_gate_cmos: | + | Above top: original transistor. |
+ | |||
+ | These textbook style metal gate transistors are rare in real devices. | ||
+ | |||
+ | Consider staining these to get more info. | ||
- | See quiz for analysis | ||
====== References ====== | ====== References ====== |
fet.1451803458.txt.gz · Last modified: 2016/01/03 06:44 by mcmaster