decap:rie
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Reactive Ion Etching (RIE) uses radio waves and an etchant gas to etch away a sample. Unlike many chemical methods, RIE is isotrophic making it suitable for etching high resolution lithography. As an analyst tool it provides a good way to both delayer and even decapsulation chips, although it tends to be much slower than alternative methods.
A typical RIE setup (an “asher”) has a bottle of gas such as SF6 fed into a quartz tube with a sample in it. The quartz tube is surrounded by magnetic coils emitting typically 13.56 MHz radio waves.
decap/rie.1382281148.txt.gz · Last modified: 2013/11/23 06:19 (external edit)