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layer [2013/06/26 04:22] – created mcmasterlayer [2013/06/26 04:26] (current) – removed mcmaster
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-ICs are made of many layers.  The specific number varies greatly depending on the "process technology" used (that is the feature size, features, etc). 
  
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-====== Bipolar ====== 
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-====== NMOS/PMOS ====== 
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-====== CMOS ====== 
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-===== Thick metal process ===== 
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-Looks like its intended for RF ICs.  Sample dimensions for 0.8 um process [Thick Metal]: 
-  * Inter-Metal Dielectric (IMD): 1.1 um 
-  * Metal thickness: 2.1 um or 2.1 um 
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-====== BiCMOS ====== 
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-====== Referneces ====== 
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-  * Thick Metal CMOS Technology on High Resistivity Substrate and Its Application to Monolithic L-Band CMOS LNAs ("Thick Metal", aka we luv long titles): http://etrij.etri.re.kr/pdfdata/21-04-01.pdf 
layer.1372220535.txt.gz · Last modified: 2013/10/20 14:59 (external edit)