test_pattern
Table of Contents
Work in progress: aims to identify the purpose of various wafer test patterns, process control monitors (PCM), alignment markers, etc.
Alignment
Pass condition: concentric
Used to align mask/reticle from layer to layer.
Continuity
Pass condition: low resistance.
A long wire that should maintain a good electrical signal.
Isolation
Pass condition: high resistance
Two wires placed close to each other that should not short.
Chain (contact, via)
Pass condition: low resistance
Contact resistance
Four point probe. Two
References
test_pattern.txt · Last modified: 2018/12/02 20:10 by mcmaster